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eScholarship
Open Access Publications from the University of California

Scholarly Works (104 results)

  • Article
Lawrence Berkeley National Laboratory (2012)
    Cover page: The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm
    • Article
    • Peer Reviewed
    Lawrence Berkeley National Laboratory (2010)
      Cover page: Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time
      • Article
      Lawrence Berkeley National Laboratory (2009)
        Cover page: MOSAIC: a new wavefront metrology
        • Article
        LBL Publications (2008)
          Cover page: Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise
          • Article
          LBL Publications (2009)
            Cover page: Don't always blame the photons: Relationships between deprotection blur, LER, and shot noise in EUV photoresists
            • Article
            LBL Publications (2009)
              Cover page: Extreme ultraviolet lithography: A few more pieces of the puzzle
              • Article
              LBL Publications (2009)
                Cover page: Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise
                • Article
                Lawrence Berkeley National Laboratory (2008)
                  Cover page: Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture
                  • Article
                  Lawrence Berkeley National Laboratory (2008)
                    Cover page: Tilt sensitivity of the two-grating interferometer
                    • Article
                    Lawrence Berkeley National Laboratory (2011)
                      Cover page: The SEMATECH Berkeley MET: extending EUV learning to 16-nm half pitch
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