Non-hydrogenated DLC films (also referred as ta-C) have been extensively studied and are used for a variety of wear related applications. Alloying DLC with refractory metals and other elements have been shown to be promising techniques to overcome some of the problems associated with pure DLC, such as excessive level of intrinsic stresses and high-temperature stability. The microstructure of DLC:Me in general consists of crystalline metal carbides dispersed in a DLC matrix. In contrary, DLC:Si has an amorphous structure. We have used filtered cathodic arc to prepare DLC:Si up to 6 percent Si, and have characterized their structure and bonding using microscopy (TEM) and spectroscopy (XPS, NEXAFS). The effect of Si in changing the bonding configuration of the C network is discussed. The microstructure is then correlated to hardness and friction measured by nano-indentation and micro-wear.

Recent developments in plasma synthesis of hard materials using energetic ions are described. Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) has been used to prepare several hard films: from diamondlike carbon (DLC) to carbides, from nitrides to oxides. The energy of the depositing species is controlled to maximize adhesion as well as to change the physical and chemical properties of the films. Adhesion is promoted by the creation of a graded interface between the film and the substrate. The energy of the depositing ions is also used to modify and control the intrinsic stresses and the microstructure of the films. The deposition is carried out at room temperature, which is important for temperature sensitive substrates. A correlation between intrinsic stresses and the energetics of the deposition is presented for the case of DLC films, and means to reduce stress levels are discussed.