The development and application of a novel endo furan-protected maleimide building block is reported. The endo isomer undergoes deprotection at temperatures ∼50 °C below the exo derivative. This enables a simple and powerful approach to quantitatively and selectively introduce functional maleimide groups via temperature modulation.

We report a simple and efficient transformation of thiol and thiocarbonylthio functional groups to bromides using stable and commercially available brominating reagents. This procedure allows for the quantitative conversion of a range of small molecule thiols (including primary, secondary and tertiary) to the corresponding bromides under mild conditions, as well as the facile chain-end modification of polystyrene (PS) homopolymers and block copolymers prepared by reversible addition-fragmentation chain transfer (RAFT) polymerization. Specifically, the direct chain-end bromination of PS prepared by RAFT was achieved, where the introduced terminal bromide remained active for subsequent modification or chain-extension using classical atom transfer radical polymerization (ATRP). This transformation sets the foundation for bridging RAFT and ATRP, two of the most widely used controlled radical polymerization (CRP) strategies, and enables the preparation of chain-end functionalized block copolymers not directly accessible using a single CRP technique.

A novel method for facile postpolymerization functionalization of synthetic polymers using terminal norbornadiene (NBD) building blocks is presented. Incorporation of the NBD functionality streamlines the synthesis of a wide array of block polymers utilizing multistep click chemistry strategies. Previously, the use of NBD-functionalized initiators produced polymers that underwent a cascade of Diels-Alder (DA) reactions to unveil a reactive cyclopentadiene (Cp) chain end. When coupled with a maleimide-bearing counterpart, a highly efficient DA cycloaddition with the terminal Cp can occur. To extend this concept to a range of polyacrylates and commercially available poly(ethylene glycol) systems, we developed a novel NBD acid building block for postpolymerization functionalization. Employing this process, we have demonstrated straightforward access to a library of block polymers that leverage this NBD click platform.

A light-mediated method for the facile removal of polymer end groups that are common to controlled radical polymerization techniques is presented. This metal-free strategy is general, being effective for chlorine, bromine, and thiocarbonylthio moieties as well as a number of different polymer families (styrenic, acrylic, and methacrylic). In addition to solution reactions, this process is readily translated to thin films, where light mediation allows the straightforward fabrication of hierarchically patterned polymer brushes.

Here we report the use of 10-phenylphenothiazine (PTH) as an inexpensive, highly reducing metal-free photocatalyst for the reduction of carbon-halogen bonds via the trapping of carbon-centered radical intermediates with a mild hydrogen atom donor. Dehalogenations were carried out on various substrates with excellent yields at room temperature in the presence of air.

We report a metal-free strategy for the chain-end modification of RAFT polymers utilizing visible light. By turning the light source on or off, the reaction pathway in one pot can be switched between either complete desulfurization (hydrogen chain-end) or simple cleavage (thiol chain-end), respectively. The versatility of this process is exemplified by application to a wide range of polymer backbones under mild, quantitative conditions using commercial reagents.

The development of an operationally simple, metal-free surface-initiated atom transfer radical polymerization (SI-ATRP) based on visible-light mediation is reported. The facile nature of this process enables the fabrication of well-defined polymer brushes from flat and curved surfaces using a "benchtop" setup that can be easily scaled to four-inch wafers. This circumvents the requirement of stringent air-free environments (i.e., glovebox), and mediation by visible light allows for spatial control on the micron scale, with complex three-dimensional patterns achieved in a single step. This robust approach leads to unprecedented access to brush architectures for nonexperts.

A highly efficient photomediated atom transfer radical polymerization protocol is reported for semi-fluorinated acrylates and methacrylates. Use of the commercially available solvent, 2-trifluoromethyl-2-propanol, optimally balances monomer, polymer, and catalyst solubility while eliminating transesterification as a detrimental side reaction. In the presence of UV irradiation and ppm concentrations of copper(II) bromide and Me₆-TREN (TREN = tris(2-aminoethyl amine)), semi-fluorinated monomers with side chains containing between three and 21 fluorine atoms readily polymerize under controlled conditions. The resulting polymers exhibit narrow molar mass distributions (Đ ≈ 1.1) and high end group fidelity, even at conversions greater than 95%. This level of control permits the in situ generation of chain-end functional homopolymers and diblock copolymers, providing facile access to semi-fluorinated macromolecules using a single methodology with unprecedented monomer scope. The results disclosed herein should create opportunities across a variety of fields that exploit fluorine-containing polymers for tailored bulk, interfacial, and solution properties.