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eScholarship
Open Access Publications from the University of California

Scholarly Works (15 results)

  • Article
Lawrence Berkeley National Laboratory (2011)
    Cover page: Out of band radiation effects on resist patterning
    • Article
    • Peer Reviewed
    Lawrence Berkeley National Laboratory (2010)
      Cover page: Assessing out-of-band flare effects at the wafer level for EUV lithography
      • Article
      Lawrence Berkeley National Laboratory (2009)
        Cover page: Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool
        • Article
        Lawrence Berkeley National Laboratory (2010)
          Cover page: Extreme ultraviolet mask substrate surface roughness effects on lithography patterning
          • Article
          Lawrence Berkeley National Laboratory (2011)
            Cover page: 22X mask cleaning effects on EUV lithography process and lifetime
            • Article
            Lawrence Berkeley National Laboratory (2009)
              Cover page: Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications
              • Article
              LBL Publications (2010)
                Cover page: EUV mask surface cleaning effects on lithography process performance
                • Article
                Lawrence Berkeley National Laboratory (2011)
                  Cover page: Replicated mask surface roughness effects on EUV lithographic pattering and line edge roughness
                  • Article
                  • Peer Reviewed
                  Lawrence Berkeley National Laboratory (2010)
                    Cover page: Lithographic performance evaluation of a contaminated EUV mask after cleaning
                    • Article
                    LBL Publications (2009)
                      Cover page: Estimating the Out-of-Band Radiation Flare Levels for Extreme Ultraviolet Lithography
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