The synthesis of bimetallic molecular silicide complexes is reported, based on the use of multiple Si-H bond activations in SiH4 at the metal centers of 14-electron LCoI fragments (L = Tp″, HB(3,5-diisopropylpyrazolyl)3-; [BP2tBuPz], PhB(CH2PtBu2)2(pyrazolyl)). Upon exposure of (Tp″Co)2(μ-N2) (1) to SiH4, a mixture of (Tp″Co)2(μ-H) (2) and (Tp″Co)2(μ-H)2 (3) was formed and no evidence for Si-H oxidative addition products was observed. In contrast, [BP2tBuPz]-supported Co complexes led to Si-H oxidative additions with the generation of silylene and silicide complexes as products. Notably, the reaction of ([BP2tBuPz]Co)2(μ-N2) (5) with SiH4 gave the dicobalt silicide complex [BP2tBuPz](H)2Co═Si═Co(H)2[BP2tBuPz] (8) in high yield, representing the first direct route to a symmetrical bimetallic silicide. The effect of the [BP2tBuPz] ligand on Co-Si bonding in 7 and 8 was explored by analysis of solid-state molecular structures and density functional theory (DFT) investigations. Upon exposure to CO or DMAP (DMAP = 4-dimethylaminopyridine), 8 converted to the corresponding [BP2tBuPz]Co(L)x adducts (L = CO, x = 2; L = DMAP, x = 1) with concomitant loss of SiH4, despite the lack of significant Si-H interactions in the starting complex. On heating to 60 °C, 8 underwent reaction with MeCl to produce small quantities of MexSiH4-x (x = 1-3), demonstrating functionalization of the μ-silicon atom in a molecular silicide to form organosilanes.