ABSTRACT OF THE DISSERTATION
Schottky Barrier Heights at Two-Dimensional Metallic and Semiconducting
Transition-Metal Dichalcogenide Interfaces
by
Adiba Zahin
Master, Graduate Program in Electrical and Computer Engineering
University of California, Riverside, September 2017
Dr. Roger K. Lake, Chairperson
Several advances have been made in the realization of electronic devices that utilize
atomically thin two-dimensional (2D) materials. The semiconducting transition metal
dichalcogenides in particular have been used to demonstrate a wide range of devices
which include steep tunnel-field-effect transistors [1,2], photodetectors [3,4], field-effecttransistors [5, 6] and chemical sensors [7, 8]. A variety of experimental [9, 10] and theoretical [11, 12] studies have been devoted to understand the interface formed between
the bulk metals that are deposited on the surface of the 2D transition metal dichalcognides. There is growing evidence that the Schottky-like transport behavior observed
in TMDC-metal contacts is a consequence of strong Fermi level pinning (FLP). The
origin of the Fermi level pinning in metal-TMDC interfaces has been attributed to the
formation of interface dipoles [11], defects at the metal-TMDC interface and the existence of metal-induced-gap-states (MIGS) which arise from the exponential decay of
the wavefunction of the metal Fermi level into the TMDC band gap [13, 14]. One approach to minimize the effect of Fermi level pinning would be achieving an epitaxially
clean interface between the metal and the semiconducting TMDC. Prior experimental
studies of the contact resistance between the 2H/1T polytypes of MoS2 succeeded in
idemonstrating record low contact resistance [15]. Indeed recent study shows that, FLP