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Scholarly Works (5 results)
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Article
Investigation of Lithographic Metrics for the Characterization of intrinisic Resolution Limits in EUV Resists
Wallow, Tom
LBL Publications
(2006)
Article
Lithographic Metrics for the Determination of Intrinsic Resolution Limits in EUV Resists
Wallow, Tom
LBL Publications
(2006)
Article
Recent Results from the Berkeley 0.3-NA EUV Microfield Exposure Tool
Wallow, Tom
LBL Publications
(2006)
Article
Advanced resist testing using the Berkeley extreme ultraviiolet microfiled exposure tool
Naulleau, Patrick P.
;
Anderson, Chris N.
;
Dean, Kim
;
Denham, Paul
;
Goldberg, Kenneth A.
;
Hoef, Brian
;
Fontaine, Bruno La
;
Wallow, Tom
LBL Publications
(2007)
Article
The SEMATECH Berkeley MET: Bridging the gap to 16-nm half pitch development
Naulleau, Patrick
;
Anderson, Christopher
;
Baclea-an, Lorie Mae
;
Denham, Paul
;
George, Simi
;
Goldberg, Kenneth A.
;
Hoef, Brian
;
Jones, Gideon
;
McClinton, Brittney
;
Miyakawa, Ryan
;
Montgomery, Warren
;
Rekawa, Seno
;
Wallow, Tom
LBL Publications
(2010)
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