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Growth of MoS2 Layers by Two-Step Chemical Vapor Deposition


Monolayer molybdenum disulfide (MoS2), a two-dimensional (2D) crystal with a direct bandgap, is a promising candidate for nano electronic devices, energy storage, and photocatalysts. People are researching for large-area single-layer MoS2 growth. In my work, I investigated the growth of monolayer MoS2 on SiO2/Si substrate by chemical vapor deposition (CVD). Using sulfur and molybdenum trioxide (MoO3) as precursors to grow 2D MoS2 in the tube furnace CVD system. As part of my thesis, I carried out several growth experiments while varying the deposition parameters. The as-grown samples are characterized using optical, scanning electron, and atomic force microscopes and Raman spectroscopy. I have also developed a two-step approach to grow MoS2 layers. This new approach has great potential to grow large- area single-layer MoS2.

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