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Effects of Ar-ion implantation and annealing on structural and magnetic properties of Co/Pd multilayers

  • Author(s): Xiao, JQ
  • Liu, K
  • Chien, CL
  • Schelp, LF
  • Schmidt, JE
  • et al.

Published Web Location

https://doi.org/10.1063/1.358371
Abstract

The contrasting effects of ion implantation and thermal annealing on structural and magnetic properties of Co/Pd multilayers have been studied. Ion implantation causes local damage to the multilayers, resulting in enhanced magnetization due to the polarization of the neighboring Pd. Thermal annealing generates massive interdiffusion across the interfaces into the formation of Co-Pd alloys with a lower magnetization. Effects on coercivity and remanence have also been studied.

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