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Open Access Publications from the University of California

Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement:

  • Author(s): Yan, Pei-Yang;
  • Zhang, Guojing;
  • Gullikson, Eric, M.;
  • Goldberg, Kenneth, A.;
  • Benk, Markus, P.
  • et al.
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