Skip to main content
eScholarship
Open Access Publications from the University of California

Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement:

  • Author(s): Yan, Pei-Yang;
  • Zhang, Guojing;
  • Gullikson, Eric, M.;
  • Goldberg, Kenneth, A.;
  • Benk, Markus, P.
  • et al.
Main Content
For improved accessibility of PDF content, download the file to your device.
Current View