UCLA

Lithography is a critical enabling technology for manufacturing micro- and nanoscale devices and structures. The present work explores alternative lithography techniques that pattern photoresist layers through selective thermochemical cross-linking. Microfabricated thin-film heaters are used as precisely defined heat sources to determine the thermal transport properties of photoresist layers and study the kinetics of cross-linking reactions. The present work identifies heating temperature, heating duration,and UV exposure dose as independent control parameters in thermolithography and demonstrates its potential for three-dimensional micro- and nanomanufacturing.