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Temporal stability of Y Ba Cu O nano Josephson junctions from ion irradiation

  • Author(s): Cybart, Shane A.
  • et al.
Abstract

We investigate the temporal stability of YBa2Cu3O7 Josephson junctions created by ion irradiation through a nano-scale implant mask fabricated using electron beam lithography and reactive ion etching. A comparison of current-voltage characteristics measured for junctions after fabrication and eight years of storage at room temperature show a slight decrease in critical current and increase in normal state resistance consistent with broadening of the weaklink from diffusion of defects. Shapiro step measurements performed 8 years after fabrication reveal that device uniformity is maintained and is strong evidence that these devices have excellent temporal stability for applications.

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