Skip to main content
Open Access Publications from the University of California

On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas

  • Author(s): Bagdasarov, GA;
  • Bobrova, NA;
  • Boldarev, AS;
  • Olkhovskaya, OG;
  • Sasorov, PV;
  • Gasilov, VA;
  • Barber, SK;
  • Bulanov, SS;
  • Gonsalves, AJ;
  • Schroeder, CB;
  • Van Tilborg, J;
  • Esarey, E;
  • Leemans, WP;
  • Levato, T;
  • Margarone, D;
  • Korn, G;
  • Kando, M;
  • Bulanov, SV
  • et al.

Published Web Location

A method for the asymmetric focusing of electron bunches, based on the active plasma lensing technique, is proposed. This method takes advantage of the strong inhomogeneous magnetic field generated inside the capillary discharge plasma to focus on the ultrarelativistic electrons. The plasma and magnetic field parameters inside the capillary discharge are described theoretically and modeled with dissipative magnetohydrodynamic computer simulations enabling analysis of the capillaries of rectangle cross-sections. Large aspect ratio rectangular capillaries might be used to transport electron beams with high emittance asymmetries, as well as assist in forming spatially flat electron bunches for final focusing before the interaction point.

Main Content
For improved accessibility of PDF content, download the file to your device.
Current View