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Design and fabrication of field‐emission tips with self‐aligned gates

Abstract

A novel approach to the design and fabrication of field-emission tips with self-aligned gates intended for electric propulsion micro-thruster applications is presented. Their micro-electromechanical systems fabrication process is derived from the recent proliferation of research toward developing field emitter arrays, which are used primarily for field-emission flat-panel display applications. An array of micronsized tips for electric field enhancement via wet isotropic etching of silicon, using silicon nitride as a hard mask is fabricated. The wet etching is accomplished using a combination of hydrofluoric, nitric, and acetic acids. The tips were then coated with a metal layer to enhance wetting by indium, the proposed propellant. Next, a layer of SU-8 photoresist was applied by spin coating and patterned to serve as a dielectric spacer. A second layer of metal was then applied to serve as a gate electrode. In addition, the results of electrostatic simulations of the prototype is described.

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