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Operation of a 0.2-1.1 keV ion source within a magnetized laboratory plasma

  • Author(s): Boehmer, H
  • Edrich, D
  • Heidbrink, WW
  • McWilliams, R
  • Zhao, L
  • Leneman, D
  • et al.

Published Web Location

https://doi.org/10.1063/1.1646766Creative Commons Attribution 4.0 International Public License
Abstract

A rf plasma-processing source produced a ∼10 mA, 0.2-1.1 keV argon ion beam at an angle of χ≃20° with respect to a 1 kG magnetic field in the LAPD device. This source is suitable for studies of collisional diffusion of fast ions.

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