Operation of a 0.2-1.1 keV ion source within a magnetized laboratory plasma
- Author(s): Boehmer, H
- Edrich, D
- Heidbrink, WW
- McWilliams, R
- Zhao, L
- Leneman, D
- et al.
Published Web Locationhttps://doi.org/10.1063/1.1646766
A rf plasma-processing source produced a ∼10 mA, 0.2-1.1 keV argon ion beam at an angle of χ≃20° with respect to a 1 kG magnetic field in the LAPD device. This source is suitable for studies of collisional diffusion of fast ions.
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