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Operation of a 0.2-1.1 keV ion source within a magnetized laboratory plasma

  • Author(s): Boehmer, H;
  • Edrich, D;
  • Heidbrink, WW;
  • McWilliams, R;
  • Zhao, L;
  • Leneman, D
  • et al.

Published Web Location Commons 'BY' version 4.0 license

A rf plasma-processing source produced a ∼10 mA, 0.2-1.1 keV argon ion beam at an angle of χ≃20° with respect to a 1 kG magnetic field in the LAPD device. This source is suitable for studies of collisional diffusion of fast ions.

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