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Predicting scattering scanning near-field optical microscopy of mass-produced plasmonic devices

  • Author(s): Otto, Lauren M
  • Burgos, Stanley P
  • Staffaroni, Matteo
  • Ren, Shen
  • Süzer, Özgün
  • Stipe, Barry C
  • Ashby, Paul D
  • Hammack, Aeron T
  • et al.

Published Web Location

https://doi.org/10.1063/1.5032222
Abstract

© 2018 Author(s). Scattering scanning near-field optical microscopy enables optical imaging and characterization of plasmonic devices with nanometer-scale resolution well below the diffraction limit. This technique enables developers to probe and understand the waveguide-coupled plasmonic antenna in as-fabricated heat-assisted magnetic recording heads. In order to validate and predict results and to extract information from experimental measurements that is physically comparable to simulations, a model was developed to translate the simulated electric field into expected near-field measurements using physical parameters specific to scattering scanning near-field optical microscopy physics. The methods used in this paper prove that scattering scanning near-field optical microscopy can be used to determine critical sub-diffraction-limited dimensions of optical field confinement, which is a crucial metrology requirement for the future of nano-optics, semiconductor photonic devices, and biological sensing where the near-field character of light is fundamental to device operation.

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