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Interfacial chemical bonding-mediated ionic resistive switching
- Moon, Hyeongjoo;
- Zade, Vishal;
- Kang, Hung-Sen;
- Han, Jin-Woo;
- Lee, Eunseok;
- Hwang, Cheol Seong;
- Lee, Min Hwan
Published Web Location
https://doi.org/10.1038/s41598-017-01493-xAbstract
In this paper, we present a unique resistive switching (RS) mechanism study of Pt/TiO2/Pt cell, one of the most widely studied RS system, by focusing on the role of interfacial bonding at the active TiO2–Pt interface, as opposed to a physico-chemical change within the RS film. This study was enabled by the use of a non-conventional scanning probe-based setup. The nanoscale cell is formed by bringing a Pt/TiO2-coated atomic force microscope tip into contact with a flat substrate coated with Pt. The study reveals that electrical resistance and interfacial bonding status are highly coupled together. An oxygen-mediated chemical bonding at the active interface between TiO2 and Pt is a necessary condition for a non-polar low-resistance state, and a reset switching process disconnects the chemical bonding. Bipolar switching mode did not involve the chemical bonding. The nature of chemical bonding at the TiO2-metal interface is further studied by density functional theory calculations.
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