Detectability and printability of EUVL mask blank defects for the 32 nm HP node

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Open Access Publications from the University of California

Lawrence Berkeley National Laboratory

Detectability and printability of EUVL mask blank defects for the 32 nm HP node

2007

Author(s): Cho, Wonil
Han, Hak-Seung
Goldberg, Kenneth A.
Kearney, Patrick A.
Jeon, Chan-Uk
et al.

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