Skip to main content
eScholarship
Open Access Publications from the University of California

Detectability and printability of EUVL mask blank defects for the 32 nm HP node

  • Author(s): Cho, Wonil;
  • Han, Hak-Seung;
  • Goldberg, Kenneth A.;
  • Kearney, Patrick A.;
  • Jeon, Chan-Uk
  • et al.
Main Content
For improved accessibility of PDF content, download the file to your device.
Current View