Lawrence Berkeley National Laboratory

The main mission of the Optical Metrology Laboratory (OML) at the Advanced Light Source (ALS) is to ensure state-of-the-art performance of beamline optics. New beamlines and instruments laid out in the ALS strategic plan as well as the plan for New Generation Light Source (NGLS) facility all involve increasingly complex optical systems that need ultra-high precision optics to achieve the specifications and goals of their state-of-the art research programs. In order to manufacture, measure, tune, and properly use these optics, we need measuring precision on the level of sub-100-nrad surface slope and sub-nm surface height precision. In the present work, we report recent developments at the ALS OML, bringing the OML measurement capabilities to a completely new level of accuracy and reliability.