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Open Access Publications from the University of California

Development of a new generation of optical slope measuring profiler


We overview the results of a broad US collaboration, including all DOE synchrotron labs (ALS, APS, BNL, NSLS-II, LLNL, LCLS), major industrial vendors of x-ray optics (InSync, Inc., SSG Precision Optronics-Tinsley, Inc., Optimax Systems, Inc.), and with active participation of HBZ-BESSY-II optics group, on development of a new generation slope measuring profiler -- the optical slope measuring system (OSMS). The desired surface slope measurement accuracy of the instrument is <50 nrad (absolute) that is adequate to the current and foreseeable future needs for metrology of x-ray optics for the next generation of light sources.

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