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X-ray optics metrology limited by random noise, instrumental drifts, and systematic errors

  • Author(s): Yashchuk, Valeriy V.
  • et al.
Abstract

Continuous, large-scale efforts to improve and develop third- and forth-generation synchrotron radiation light sources for unprecedented high-brightness, low emittance, and coherent x-ray beams demand diffracting and reflecting x-ray optics suitable for micro- and nano-focusing, brightness preservation, and super high resolution. One of the major impediments for development of x-ray optics with the required beamline performance comes from the inadequate present level of optical and at-wavelength metrology and insufficient integration of the metrology into the fabrication process and into beamlines. Based on our experience at the ALS Optical Metrology Laboratory, we review the experimental methods and techniques that allow us to mitigate significant optical metrology problems related to random, systematic, and drift errors with super-high-quality x-ray optics. Measurement errors below 0.2 mu rad have become routine. We present recent results from the ALS of temperature stabilized nano-focusing optics and dedicated at-wavelength metrology. The international effort to develop a next generation Optical Slope Measuring System (OSMS) to address these problems is also discussed. Finally, we analyze the remaining obstacles to further improvement of beamline x-ray optics and dedicated metrology, and highlight the ways we see to overcome the problems.

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