Fabrication and performance of nanoscale ultra-smooth programmed defects for EUV Lithography
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Fabrication and performance of nanoscale ultra-smooth programmed defects for EUV Lithography

  • Author(s): Olynick, D.L.;
  • Salmassi, F.;
  • Liddle, J.A.;
  • Mirkarimi, P.B.;
  • Spiller, E.;
  • Baker, S.L.;
  • Robinson, J.
  • et al.
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