Barrier-free contact to MoS2 transistor and the transport properties of its localized states
The two-dimensional layered materials such as molybdenum disulfide (MoS2) have attracted tremendous interest as a new class of electronic materials. However, there are considerable challenges in replacing silicon with two-dimensional materials to build large-scale integrated circuits in the semiconductor industry. The commercialization of two-dimensional layered materials requires further enhancement of the electronic device performance. Therefore, the reliable device contact and the carrier transport are significantly important. Here I would present a new protocol to make barrier-free contact to MoS2 transistor and the carrier transport studies based on the barrier-free MoS2 transistors.