Epitaxial ferroelectric heterostructures fabricated by selective area epitaxy of SrRuO 3 using an MgO mask
- Author(s): Karthik, J
- Damodaran, AR
- Martin, LW
- et al.
Published Web Locationhttps://doi.org/10.1002/adma.201104697
Illustration of a new high-temperature hard-mask process based on traditional lithography and selective wet-etching of MgO. The hard mask is compatible with standard nano-lithography techniques and heat treatments in excess of 1000 °C. Here, this technique is applied to produce temperature-stable contacts that give rise to low leakage, improved fatigue properties, and excellent high-temperature stability in ferroelectric thin-film capacitors. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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