Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
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Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage

  • Author(s): Pasaja, Nitisak
  • Sansongsiri, Sakon
  • Intasiri, Sawate
  • Vilaithong, Thiraphat
  • Anders, Andre
  • et al.
Abstract

Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated insequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absentwhen the molybdenum plasma was presented. Film thickness was measured after deposition by profilometry. Glass slides with silver padswere used as substrates for the measurement of the sheet resistance. The microstructure and composition of the films were characterizedby Raman spectroscopy and Rutherford backscattering, respectively. It was found that the electrical resistivity decreases with an increaseof the Mo content, which can be ascribed to an increase of the sp2 content and an increase of the sp2 cluster size.

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