Chang, Chang-Hwan; Valek, B.C.; Padmore, H.A.; MacDowell, A.A.; Celestre, R.; Marieb, T.; Bravman, J.C.; Koo, Y.M.; Patel, J.R.; Chang, Chang-Hwan; Valek, B.C.; Padmore, H.A.; MacDowell, A.A.; Celestre, R.; Marieb, T.; Bravman, J.C.; Koo, Y.M.; Patel, J.R.

Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction

1999

Abstract

The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-mu m width were investigated by using an incidentwhite x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05o sensitivity by the micro Laue diffraction technique.

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Lawrence Berkeley National Laboratory

Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction