Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction
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Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction

  • Author(s): Chang, Chang-Hwan
  • Valek, B.C.
  • Padmore, H.A.
  • MacDowell, A.A.
  • Celestre, R.
  • Marieb, T.
  • Bravman, J.C.
  • Koo, Y.M.
  • Patel, J.R.
  • et al.
Abstract

The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-mu m width were investigated by using an incidentwhite x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05o sensitivity by the micro Laue diffraction technique.

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