Chang, Chang-Hwan; Valek, B.C.; Padmore, H.A.; MacDowell, A.A.; Celestre, R.; Marieb, T.; Bravman, J.C.; Koo, Y.M.; Patel, J.R.

Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction

1999

Abstract

The crystallographic orientations of individual grains in a passivated aluminum interconnect line of 0.7-mu m width were investigated by using an incidentwhite x-ray microbeam at the Advanced Light Source, Berkeley National Laboratory. Intergrain orientation mapping was obtained with about 0.05o sensitivity by the micro Laue diffraction technique.

Main Content

For improved accessibility of PDF content, download the file to your device.

Lawrence Berkeley National Laboratory

Grain orientation measurement of passivated aluminum interconnects by x-ray micro diffraction