Lawrence Berkeley National Laboratory
193 nm photodissociation of thiophene Probed using synchrotron radiation
- Author(s): Qi, Fei
- et al.
The photodissociation dynamics of thiophene, c-C4H4S, have been studied at 193 nm using tunable synchrotron undulator radiation as a universal product probe. Five primary dissociation channels have been observed, and the translational energy distributions and photoionization efficiency spectra have been recorded for all products. The evidence suggests that dissociation occurs on the ground-state surface following internal conversion.