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Liberation of ion implanted Ge nanocrystals from a silicon dioxide matrix via hydrofluoric acid vapor etching

  • Author(s): Sharp, I.D.
  • Xu, Q.
  • Liao, C.Y.
  • Ager, J.W.
  • Beeman, J.W.
  • Yu, K.M.
  • Zakharov, D.
  • Liliental-Weber, Z.
  • Haller, E.E.
  • et al.
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