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Liberation of ion implanted Ge nanocrystals from a silicon dioxide matrix via hydrofluoric acid vapor etching
- Author(s): Sharp, I.D.
- Xu, Q.
- Liao, C.Y.
- Ager, J.W.
- Beeman, J.W.
- Yu, K.M.
- Zakharov, D.
- Liliental-Weber, Z.
- Haller, E.E.
- et al.