The SEMATECH Berkeley MET & DCT: a quest for 14-nm half-pitch in chemically amplified resist, OOB contrast of EUV resists, and 6.x-nm lithography

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Open Access Publications from the University of California

The SEMATECH Berkeley MET & DCT: a quest for 14-nm half-pitch in chemically amplified resist, OOB contrast of EUV resists, and 6.x-nm lithography

2012

McClinton, Brittany