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Open Access Publications from the University of California

Tribo-Chemical Modeling of Copper CMP

Abstract

We are developing an integrated tribo-chemical model of copper CMP that considers abrasive and pad properties, process parameters (speed, pressure etc.), and slurry chemistry to predict material removal rates. In this paper, the framework of the model is explained, and two important constituents of the model are presented: transient passivation behavior and characteristics of mechanical interactions.

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