Development of a new generation of optical slope measuring profiler
A collaboration, including all DOE synchrotron labs, industrial vendors of x-ray optics, and with active participation of the HBZ-BESSY-II optics group has been established to work together on a new slope measuring profiler -- the optical slope measuring system (OSMS). The slope measurement accuracy of the instrument is expected to be <50 nrad for the current and future metrology of x-ray optics for the next generation of light sources. The goals were to solidify a design that meets the needs of mirror specifications and also be affordable; and to create a common specification for fabrication of a multi-functional translation/scanning (MFTS) system for the OSMS. This was accomplished by two collaborative meetings at the ALS (March 26, 2010) and at the APS (May 6, 2010).