It is shown that the requirements for high quality electron bunch generation and trapping from an underdense photocathode in plasma wakefield accelerators can be substantially relaxed through localizing it on a plasma density downramp. This depresses the phase velocity of the accelerating electric field until the generated electrons are in phase, allowing for trapping in shallow trapping potentials. As a consequence the underdense photocathode technique is applicable by a much larger number of accelerator facilities. Furthermore, dark current generation is effectively suppressed.