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Scholarly Works (89 results)
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Article
Peer Reviewed
Pushing EUV lithography development beyond 22-nm half pitch
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2010)
Article
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2011)
Article
Recent results from the Berkeley 0.3-NA microfield exposure tool
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2009)
Article
Peer Reviewed
Microfield exposure tool enables advances in EUV lithography development
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2009)
Article
EUV extendibility: challenges facing EUV at 1x and beyond
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2014)
Article
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2008)
Article
EUV Resists: Illuminating the challenges
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2011)
Article
Nano-patterning research at LBNL: enabling new science and technologies
Naulleau, Patrick
et al.
Recent Work
(2010)
Article
The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2009)
Article
The effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
Naulleau, Patrick
et al.
Lawrence Berkeley National Laboratory
(2009)
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