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eScholarship
Open Access Publications from the University of California

Scholarly Works (89 results)

  • Article
  • Peer Reviewed
Lawrence Berkeley National Laboratory (2010)
    Cover page: Pushing EUV lithography development beyond 22-nm half pitch
    • Article
    Lawrence Berkeley National Laboratory (2011)
      Cover page: Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations
      • Article
      Lawrence Berkeley National Laboratory (2009)
        Cover page: Recent results from the Berkeley 0.3-NA microfield exposure tool
        • Article
        • Peer Reviewed
        Lawrence Berkeley National Laboratory (2009)
          Cover page: Microfield exposure tool enables advances in EUV lithography development
          • Article
          Lawrence Berkeley National Laboratory (2014)
            Cover page: EUV extendibility: challenges facing EUV at 1x and beyond
            • Article
            Lawrence Berkeley National Laboratory (2008)
              Cover page: Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
              • Article
              Lawrence Berkeley National Laboratory (2011)
                Cover page: EUV Resists: Illuminating the challenges
                • Article
                Recent Work (2010)
                  Cover page: Nano-patterning research at LBNL: enabling new science and technologies
                  • Article
                  Lawrence Berkeley National Laboratory (2009)
                    Cover page: The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond
                    • Article
                    Lawrence Berkeley National Laboratory (2009)
                      Cover page: The effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
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