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Scholarly Works (128 results)
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Article
EUV learning at LBNL: past, present and future
Naulleau, Patrick
LBL Publications
(2010)
Article
Optical Lithography
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2012)
Article
Optics, mask and resist implications on contact CDU
Naulleau, Patrick
LBL Publications
(2010)
Article
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2008)
Article
EUV extendibility: challenges facing EUV at 1x and beyond
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2014)
Article
Mask roughness challenges in extreme ultraviolet mask development
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2011)
Article
Nano-patterning research at LBNL: enabling new science and technologies
Naulleau, Patrick
LBL Publications
(2010)
Article
The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2009)
Article
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations
Naulleau, Patrick
Lawrence Berkeley National Laboratory
(2011)
Article
Characterization of advanced EUV resists using the Berkeley MET tool
Naulleau, Patrick
LBL Publications
(2006)
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