This dissertation presents a growth and characterization study of MoS2 thin films
deposited by pulsed laser deposition, with specific interest in demonstrating precise
thickness control down to a single monolayer and high film uniformity over large
areas (0.25 cm2). Limits to traditional methods for scaling field effect based switching
devices have necessitated the development of alternative device architectures.
Devices utilizing two-dimensional materials such as MoS2 have demonstrated
improved electrostatic integrity at small scales while tunneling field effect transistors
have demonstrated a pathway toward reduced power consumption. However,
drawbacks to previously explored synthesis techniques have limited the applicability
of MoS2 for these applications. Toward this goal, the work presented establishes
repeatable growth conditions to fabricate highly crystalline and uniform MoS2 thin
films over technologically significant dimensions and establishes the efficacy of pulsed
laser deposition as a suitable synthesis technique. Films grown herein are found to be
P-type with significant defect densities suggesting avenues for future research.