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Effect of processing conditions on additive DISC patterning of P3HT films

  • Author(s): Li, Jun
  • Holm, Daniella M
  • Guda, Shravya
  • Bedolla-Valdez, Zaira I
  • Gonel, Goktug
  • Jacobs, Ian E
  • Dettmann, Makena A
  • Saska, Jan
  • Mascal, Mark
  • Moulé, Adam J
  • et al.
Abstract

There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.

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