Assessing the extendibility of chemically amplified resists through the use of mtf analysis employing 193 immersion il, euv il and e-beam lithography

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Assessing the extendibility of chemically amplified resists through the use of mtf analysis employing 193 immersion il, euv il and e-beam lithography

2006

Author(s): Truong, H.
et al.

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