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How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
- Anderson, Chris;
- Allezy, Arnaud;
- Chao, Weilun;
- Conley, Lucas;
- Cork, Carl;
- Cork, Will;
- Delano, Rene;
- DePonte, Jason;
- Dickinson, Michael;
- Gaines, Geoff;
- Gamsby, Jeff;
- Gullikson, Eric;
- Jones, Gideon;
- McQuade, Lauren;
- Miyakawa, Ryan;
- Naulleau, Patrick;
- Rekawa, Seno;
- Salmassi, Farhad;
- Vollmer, Brandon;
- Zehm, Daniel;
- Zhu, Wenhua
- Editor(s): Felix, Nelson M;
- Lio, Anna
Published Web Location
https://doi.org/10.1117/12.2552125Abstract
Vibration levels in MET5 exposures were reduced from 1.5 nm RMS to 0.8 nm RMS by tuning the vibration isolation system and removing non-compliant hardware. Frequency doubling exposures were improved by replacing the Fourier synthesis pupil scanner mirror. Focus-exposure-matrix outliers have been solved by patching a bug in the control software. 9 nm half-pitch lines and 8 nm half-pitch lines were printed in 11 nm thick MOx resist.
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