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Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
- Anderson, Christopher;
- Allezy, Arnaud;
- Chao, Weilun;
- Cork, Carl;
- Cork, Will;
- Delano, Rene;
- DePonte, Jason;
- Dickinson, Michael;
- Gaines, Geoff;
- Gamsby, Jeff;
- Gullikson, Eric;
- Jones, Gideon;
- Meyers, Stephen;
- Miyakawa, Ryan;
- Naulleau, Patrick;
- Rekawa, Senajith;
- Salmassi, Farhad;
- Vollmer, Brandon;
- Zehm, Daniel;
- Zhu, Wenhua
- Editor(s): Goldberg, Kenneth A
- et al.
Published Web Location
https://doi.org/10.1117/12.2516339Abstract
A 0.5-NA extreme ultraviolet micro-field exposure tool has been installed and commissioned at beamline 12.0.1.4 of the Advanced Light Source synchrotron facility at Lawrence Berkeley National Laboratory. Commissioning has demonstrated a patterning resolution of 13 nm half-pitch with annular 0.35-0.55 illumination; a patterning resolution of 8 nm half-pitch with annular 0.1-0.2 illumination; critical dimension (CD) uniformity of 0.7 nm 1σ on 16 nm nominal CD across 80% of the 200 um x 30 um aberration corrected field of view; aerial image vibration relative to the wafer of 0.75 nn RMS and focus control and focus stepping better than 15 nm.