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Structural inversion asymmetry in epitaxial ultrathin films of Bi(111)/InSb(111)B
- Inbar, Hadass S;
- Zubair, Muhammad;
- Dong, Jason T;
- Engel, Aaron N;
- Dempsey, Connor P;
- Chang, Yu Hao;
- Nishihaya, Shinichi;
- Khalid, Shoaib;
- Fedorov, Alexei V;
- Janotti, Anderson;
- Palmstrøm, Chris J
Published Web Location
https://doi.org/10.1103/physrevmaterials.9.054202Abstract
Bismuth (Bi) films hold potential for spintronic devices due to strong spin-orbit coupling. Understanding the growth, surface states, and interactions with the substrate is key to their functionalization. Large-area high-quality (111) Bi ultrathin films were grown on InSb (111)B substrates by molecular beam epitaxy (MBE). Strong film-substrate interactions epitaxially stabilize the (111) orientation and lead to nonequivalent interface potentials. Analysis of angle-resolved photoemission spectroscopy (ARPES) measurements, employed to characterize the evolution of the surface states with film thickness, indicate a crossing at the M¯ point, suggesting a topologically trivial phase in the thin film. The results show the presence of interfacial bonds to the substrate breaks inversion symmetry, preventing the semimetal-to-semiconductor transition predicted for freestanding bismuth layers, highlighting the importance of controlled functionalization and surface passivation of two-dimensional materials.
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