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Printing EUV Phase-shift Masks using the 0.3NA Berkeley Micro-exposure Tool
- Fontaine, Bruno La;
- Pawloski, Adam R.;
- Wood, Obert R.;
- Levinson, Harry;
- Denham, Paul;
- Gullikson, Eric;
- Hoef, Brian;
- Naulleau, Patrick;
- Holfeld, Christian;
- Chovino, Christian;
- Letzkus, Florian
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